Siemens Process

Siemens Process

When it comes to the Siemens process for silicon production, we offer a broad portfolio of products and solutions for optimizing process quality. In addition to graphitic elements in the deposition reactor (CVD), Schunk also produces a variety of components for the conversion unit. In addition to regular graphites/insulation materials and CFC, we also offer customer-specific solutions and refinements.

You benefit from these advantages:

  • Optimum precision in the production of graphite electrodes
  • High-temperature cleaning of the materials used
  • Boron and phosphorous residual contamination < 1 ppm (ppb < 200)
  • CVD/CVI coating technology for crystalline ß-SiC layers
  • CVD/CVI technology for the deposition of highly oriented pyrocarbon (PyC)
  • Comprehensive coating, including in complex component geometries
  • Maximum purity coupled with maximum service life
  • Standard components and customer-specific solutions and developments
  • Cleaning and CVD up to D 1700 mm x 2000 mm possible