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Siemens Process
When it comes to the Siemens process for silicon production, we offer a broad portfolio of products and solutions for optimizing process quality. In addition to graphitic elements in the deposition reactor (CVD), Schunk also produces a variety of components for the conversion unit. In addition to regular graphites/insulation materials and CFC, we also offer customer-specific solutions and refinements.
You benefit from these advantages:
- Optimum precision in the production of graphite electrodes
- High-temperature cleaning of the materials used
- Boron and phosphorous residual contamination < 1 ppm (ppb < 200)
- CVD/CVI coating technology for crystalline ß-SiC layers
- CVD/CVI technology for the deposition of highly oriented pyrocarbon (PyC)
- Comprehensive coating, including in complex component geometries
- Maximum purity coupled with maximum service life
- Standard components and customer-specific solutions and developments
- Cleaning and CVD up to D 1700 mm x 2000 mm possible